卷對(duì)卷式柔性LB膜分析儀
卷對(duì)卷式柔性LB膜分析儀儀器是一種多功能的LB莫分析儀，具有柔性鍍膜，剛性鍍膜，垂直鍍膜，水平鍍膜功能。
卷對(duì)卷式柔性LB膜分析儀儀器用于在較長的柔性基底（如保鮮膜式柔性帶狀基底）上連續(xù)沉積單分子薄膜，也可把大尺寸剛性襯底粘接在皮帶上進(jìn)行鍍膜，可進(jìn)行無限多次LB薄膜沉積，可控制柔性基底順時(shí)針或逆時(shí)針旋轉(zhuǎn)，沉積X,Y,Z多種類型的LB薄膜結(jié)構(gòu)。同時(shí)具備垂直鍍膜與水平鍍膜功能。襯底可以是卷式鋁箔、卷式PET塑料薄膜等。設(shè)備包含鍍膜槽，卷對(duì)卷樣品傳動(dòng)裝置，卷對(duì)卷轉(zhuǎn)動(dòng)滑障與水平移動(dòng)滑障，表面壓探頭與鍍膜頭，自動(dòng)進(jìn)樣裝置：注射泵與蠕動(dòng)泵，控制器，電腦。
卷對(duì)卷式柔性LB膜分析儀液體界面單分子薄膜鍍膜儀器可進(jìn)行無限多次薄膜沉積，可控制柔性基底順時(shí)針或逆時(shí)針旋轉(zhuǎn)，沉積x、y、z型結(jié)構(gòu)的薄膜。
卷對(duì)卷式柔性LB膜分析儀技術(shù)指標(biāo)：
柔性基底鍍膜尺寸范圍：長度可達(dá)3m，寬度可達(dá)16.5cm
柔性基底傳送速度范圍： 0.4625-117 mm/s，調(diào)整步階0.007725 mm/s。
鍍膜井尺寸：200x180x200 mm (w-d-h)。剛性基底尺寸。
侵入液體的基片尺寸：不小于170x170x170 mm (w-d-h)，兼容常規(guī)片狀固體基片。
剛性基底面積：不小于170x170mm。
表面壓傳感器：帶2個(gè)表面壓傳感器，分別測量鍍膜區(qū)域與補(bǔ)樣區(qū)域的表面壓值，表面壓傳感器靈敏度：0.01 mN/m，測量范圍：0-80 mN/m。
卷對(duì)卷式LB膜分析儀LangmuirBlodgett trough LT-310 is experimental research apparatus intended for deposition of mono- and multimolecular films according to the LangmuirBlodgett (LB) and similar techniques. It is also suitable for deposition of thin layers of various nature on solid substrates. Additional units and accessories enable the monomolecular layer deposition for versatile substrate types: a winding unit realizes deposition of LB layers onto flexible substrates (tape) and onto flat rigid substrates attached to the winded tape; rig for horizontal precipitation allows to deposit monomolecular layers onto submerged substrate according to Langmuir-Schaefer (horizontal precipitation, HP) technique by the liquid level lowering (draining).
卷對(duì)卷式LB膜分析儀LT-310 can be applied for
application of monomolecular films on solid samples according to the Langmuir-Blodgett (LB) technique or to the horizontal precipitation (HP) technique
deposition of multimolecular films using corresponding layer-by-layer technique
formation of mono- and multimolecular composite coatings on solid surfaces
modification of the surface properties (hydrophilic behavior, optical, electrical properties etc. )
fundamental research in ultrathin film fabrication and their use as insulating and protective coatings, molecular electronic elements, in biology for creation of bilayer lipid membranes etc.
FEATURES
卷對(duì)卷式LB膜分析儀技術(shù)參數(shù)：
Number of barriers: | One |
Full free surface area: | 855 cm2 |
Maximum free surface area confined with the barrier: | 815 cm2 |
Compressed (effective) area: | 620 cm2 |
Liquid medium volume: | 9600-10900 cm3 |
Dipping well: | not smaller than 250x180x200 mm (w-d-h) |
Maximum dimensions of the immersed substrate: | 170x170x170 mm (w-d-h) |
Travel range of the movable horizontal barrier: | 350 mm |
Velocity range of the barrier motion: | - single side compression 0.01 to 50 mm/min |
Dipper mechanism stroke: | 86 mm (vertical position of the unit can be adjusted manually) |
Dipper mechanism velocity range: | 0.0140 mm/min, |
Step of the dipper mechanism velocity change: | 0.1 mm/min |
Possibility of altering different monomolecular layers deposition: | Available |
Delay between the layers deposition: | 0100000 s |
Surface tension sensor: | based on Wilhelmy plate 15x15 mm (vertical position of the sensor can be adjusted manually) |
Working range of the surface tension sensor: | 0-80 mN/m (stepped and fine adjustment of the range are available) |
Sensitivity of the surface tension sensor: | 0.05 mN/m |
Number of surface tension sensors: | One / Two (two sensors my be used by default) |
Doser for substance feed to aqueous surface: | - syringe pump: with substance reserve 1 ml (syringes of up to 10 ml applicable), motion range of leading rod 65 mm
- peristaltic pump with flow rate about 0.157 ml per one revolution of motor |
Overall dimensions: | Trough without mounted rig not bigger than 490x280x260 mm (w-d-h);
Maximum size with installed accessories 660x340x500 mm (w-d-h);
Control unit 200x293x80 mm (w-d-h);
Total weight (with all accessories and control unit) 21 kg |
Supply voltage: | 240 V / 2.3 A / 50 Hz |
Control voltage supplied from control unit to elements of the trough: | +5 V; -5 V; +15 V |
Power consumption: | Average 100 W, peak not more than 500 W (without host PC) |
Additional accessories: | Substrate clamping holder for fixing a flat sample on the dipper lever. Rig for film application by the horizontal precipitation method (by liquid medium draining)*. A mountable unit for tape substrate winding with set of guides. A syringe pump doser or peristaltic pump to feed substance film on liquid interface. Rotating barrier for substance film transfer into the deposition zone. One draining nozzle at bottom of the dipping well and 3 additional nozzles in shallow area, all nozzles for connecting tube of 5 mm inner diameter.
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TECHNIQUES
卷對(duì)卷式LB膜分析儀技術(shù)：
| Deposition of X-type LB film | 
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| Deposition of Y-type LB film | 
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| Deposition of Z-type LB film | 
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| Horizontal precipitation (HP) method (by liquid medium draining) provides surface modification by extremely uniform and homogenous monolayer films (see, for examplethis paper). HP method allows transferring of monolayer films at various surfaces simultaneously from huge variety of surfactants (both in solid and liquid state) despite of polar head structure. The process of deposition is simple and fast. In particular, the surface of metallized silicon wafer can be modified by HP method within 3-5 minutes. | 
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| Roll-To-Roll deposition technique engages additional accessories in the set of LB trough LT-310 to deposit monomolecular film on tape (continuous deposition on flexible substrate). In LT-310, extraction angle of the exiting portion of tape may be adjusted in range 30-90owith step 5o | 
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實(shí)驗(yàn)數(shù)據(jù)：
1. SEM images of the monolayer of silica spheres D1 = 250 nm (a, b) and D2 = 550 nm (c?f) deposited on the PET film using the roll-to-roll LB method. * from M. Parchine, J. McGrath, M. Bardosova, M. E. Pemble,Large Area 2D and 3D Colloidal Photonic Crystals Fabricated by a Roll-to-Roll Langmuir–Blodgett Method, Langmuir,32, 5862 (2016)
2、AFM-images of bi-componentLB-film ofPMMA/DPPC on PETP-tape
(Roll-to-roll technique, p=30 mN/m)，(a) topographic mode, (b) friction mode
* By Dr. G.K. Zhavnerko etc.
